Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy

A. Brady-Boyd, R. O'Connor, S. Armini, S. Selvaraju, G. Hughes, J. Bogan

Allbwn ymchwil: Pennod mewn Llyfr/Adroddiad/Trafodion CynhadleddTrafodion Cynhadledd (Nid-Cyfnodolyn fathau)

Crynodeb

Electroless deposited (ELD) cobalt with palladium as a catalyst, and an underlying self-assembled monolayer (SAM) was investigated for potential use in advanced complementary metal oxide semiconductor (CMOS) applications using both hard (HAXPES) and soft (XPS) x-ray photoelectron spectroscopy. HAXPES spectra established the uniformity of the deposited Co film and the nature of the buried Co-Si interface 20nm below the surface. The Pd is seen to diffuse through the Co following thermal annealing. While the deposited Co film is predominantly metallic, Co-silicide forms at the Co-Si interface upon deposition and decomposes with thermal anneal up to 500°C.

Iaith wreiddiolSaesneg
Teitl18th International Conference on Nanotechnology, NANO 2018
CyhoeddwrIEEE Press
ISBN (Electronig)9781538653364
Dynodwyr Gwrthrych Digidol (DOIs)
StatwsCyhoeddwyd - 27 Ion 2019
Cyhoeddwyd yn allanolIe
Digwyddiad18th International Conference on Nanotechnology, NANO 2018 - Cork, Iwerddon
Hyd: 23 Gorff 201826 Gorff 2018

Cyfres gyhoeddiadau

EnwProceedings of the IEEE Conference on Nanotechnology
Cyfrol2018-July
ISSN (Argraffiad)1944-9399
ISSN (Electronig)1944-9380

Cynhadledd

Cynhadledd18th International Conference on Nanotechnology, NANO 2018
Gwlad/TiriogaethIwerddon
DinasCork
Cyfnod23 Gorff 201826 Gorff 2018

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