On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

Anita Brady-Boyd; Robert O'Connor; Silvia Armini; V. Selvaraju; Greg Hughes; J. Bogan

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

Anita Brady-Boyd, Robert O'Connor, Silvia Armini, V. Selvaraju, Greg Hughes, J. Bogan

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Iaith wreiddiol	Saesneg
Teitl	2017 Materials for Advanced Metallization Conference MAM
Statws	Cyhoeddwyd - 2017
Digwyddiad	Materials for Advanced Metallization Conference - Dresden, Yr Almaen Hyd: 26 Maw 2017 → 29 Maw 2017

Cynhadledd

Cynhadledd	Materials for Advanced Metallization Conference
Teitl cryno	MAM2017
Gwlad/Tiriogaeth	Yr Almaen
Dinas	Dresden
Cyfnod	26 Maw 2017 → 29 Maw 2017

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On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers
Brady-Boyd, A., O'Connor, R., Armini, S., Selvaraju, V., Hughes, G. & Bogan, J., 01 Ion 2018, Yn: Applied Surface Science. 427, t. 260-266 7 t.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
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@inproceedings{a1bc78ff16c147ef82119d58c160377d,

title = "On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers",

author = "Anita Brady-Boyd and Robert O'Connor and Silvia Armini and V. Selvaraju and Greg Hughes and J. Bogan",

year = "2017",

language = "English",

booktitle = "2017 Materials for Advanced Metallization Conference MAM",

note = "Materials for Advanced Metallization Conference, MAM2017 ; Conference date: 26-03-2017 Through 29-03-2017",

}

Brady-Boyd, A, O'Connor, R, Armini, S, Selvaraju, V, Hughes, G & Bogan, J 2017, On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers. yn 2017 Materials for Advanced Metallization Conference MAM. Materials for Advanced Metallization Conference, Dresden, Yr Almaen, 26 Maw 2017.

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers. / Brady-Boyd, Anita; O'Connor, Robert; Armini, Silvia et al.
2017 Materials for Advanced Metallization Conference MAM. 2017.

Allbwn ymchwil: Pennod mewn Llyfr/Adroddiad/Trafodion Cynhadledd › Trafodion Cynhadledd (Nid-Cyfnodolyn fathau)

TY - GEN

T1 - On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

AU - Brady-Boyd, Anita

AU - O'Connor, Robert

AU - Armini, Silvia

AU - Selvaraju, V.

AU - Hughes, Greg

AU - Bogan, J.

PY - 2017

Y1 - 2017

M3 - Conference Proceeding (Non-Journal item)

BT - 2017 Materials for Advanced Metallization Conference MAM

T2 - Materials for Advanced Metallization Conference

Y2 - 26 March 2017 through 29 March 2017

ER -

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

Cynhadledd

Cysylltiad parhaol

Allbwn Ymchwil

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

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