My current research interests lie in area selective deposition (ASD) as a means of bottom up nanofabrication for next generation electronic devices. This is an exciting and relatively new field of research. The aim of ASD is to selectively deposit on one area/material on a surface while simultaneously blocking the deposition on other areas/materials present on the surface. As the dimensions in our electronic devices continues to decrease the ability to deposit on smaller and smaller scales becomes more difficult and expensive. To continue the industry downscaling trend new materials and methods for deposition must be investigated and this is where ASD is expected to lead to a shift in how devices are fabricated. To block deposition  short 2d molecules called self-assembled monolayers are used. I use photoemission techniques (lab-based XPS and synchrotron based) to explore the thin films and organic molecules used in ASD and investigate how these materials interact with each other. I also use some microscopy techniques such as AFM and SEM.

My other research interests include high entropy metal alloys and 2D materials.

Module Coordinator - PH/FG05720 Introduction to Laboratory Physics

Lecturer - PH/FG15720 & PH/FG15510 Laboratory Techniques for Experimental Physics