@article{6cd4aca9b2b54628af033a5525e1fa26,
title = "A Simplified Method for Patterning Graphene on Dielectric Layers",
abstract = "The large-scale formation of patterned, quasi-freestanding graphene structures supported on a dielectric has so far been limited by the need to transfer the graphene onto a suitable substrate and contamination from the associated processing steps. We report μm scale, few-layer graphene structures formed at moderate temperatures (600–700 °C) and supported directly on an interfacial dielectric formed by oxidizing Si layers at the graphene/substrate interface. We show that the thickness of this underlying dielectric support can be tailored further by an additional Si intercalation of the graphene prior to oxidation. This produces quasi-freestanding, patterned graphene on dielectric SiO2 with a tunable thickness on demand, thus facilitating a new pathway to integrated graphene microelectronics.",
keywords = "LEEM, NEXAFS, PEEM, electrical decoupling, graphene, patterned growth, photoelectron spectroscopy",
author = "R{\o}st, \{H{\aa}kon I.\} and Reed, \{Benjamen P.\} and Strand, \{Frode S.\} and Durk, \{Joseph A.\} and Evans, \{D. Andrew\} and Antonija Grubi{\v s}i{\'c}-{\v c}abo and Gary Wan and Mattia Cattelan and Prieto, \{Mauricio J.\} and Gottlob, \{Daniel M.\} and T{\u a}nase, \{Liviu C.\} and \{De Souza Caldas\}, Lucas and Thomas Schmidt and Anton Tadich and Cowie, \{Bruce C. C.\} and Chellappan, \{Rajesh Kumar\} and Wells, \{Justin W.\} and Cooil, \{Simon P.\}",
note = "This work was partly supported by the Research Council of Norway through its Centres of Excellence funding scheme, project number 262633 “QuSpin”, through project number 250555/O70 “GraSeRad”, and through the Norwegian Micro- and Nano-Fabrication Facility, NorFab, project number 245963/F50. The SMART instrument was financially supported by the Federal German Ministry of Education and Research (BMBF) under the contract 05KS4WWB/4, as well as by the Max-Planck Society. Parts of this research were undertaken on the UE49-PGM-SMART beamline at BESSY II and on the soft X-ray spectroscopy beamline at the Australian Synchrotron, part of ANSTO. The authors thank both the Helmholtz-Center Berlin for Materials and Energy (HZB) and ANSTO for the allocation of beamtime. S.P.C. would like to acknowledge the European Regional Development Fund (ERDF) and the Welsh European Funding Office (WEFO) for funding the 2nd Solar Photovoltaic Academic Research Consortium (SPARC II). B.P.R. and J.A.D. acknowledge the EPSRC CDT in Diamond Science and Technology. L.d.S.C. is grateful for the funding through the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany{\textquoteright}s Excellence Strategy-EXC 2008-390540038 (UniSysCat). H.I.R., J.W.W., and S.P.C. would also like to thank Dr. Neil Fox, Dr. Mark Edmonds, Dr. Nils Weber, and Ms. Anna Cecilie {\AA}sland for fruitful discussions. Funding Information: This work was partly supported by the Research Council of Norway through its Centres of Excellence funding scheme, project number 262633 “QuSpin”, through project number 250555/O70 “GraSeRad”, and through the Norwegian Micro- and Nano-Fabrication Facility, NorFab, project number 245963/F50. The SMART instrument was financially supported by the Federal German Ministry of Education and Research (BMBF) under the contract 05KS4WWB/4, as well as by the Max-Planck Society. Parts of this research were undertaken on the UE49-PGM-SMART beamline at BESSY II and on the soft X-ray spectroscopy beamline at the Australian Synchrotron, part of ANSTO. The authors thank both the Helmholtz-Center Berlin for Materials and Energy (HZB) and ANSTO for the allocation of beamtime. S.P.C. would like to acknowledge the European Regional Development Fund (ERDF) and the Welsh European Funding Office (WEFO) for funding the 2nd Solar Photovoltaic Academic Research Consortium (SPARC II). B.P.R. and J.A.D. acknowledge the EPSRC CDT in Diamond Science and Technology. L.d.S.C. is grateful for the funding through the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany{\textquoteright}s Excellence Strategy-EXC 2008-390540038 (UniSysCat). H.I.R., J.W.W., and S.P.C. would also like to thank Dr. Neil Fox, Dr. Mark Edmonds, Dr. Nils Weber, and Ms. Anna Cecilie {\AA}sland for fruitful discussions. Publisher Copyright: {\textcopyright} 2021 The Authors. Published by American Chemical Society.",
year = "2021",
month = aug,
day = "11",
doi = "10.1021/acsami.1c09987",
language = "English",
volume = "13",
pages = "37510--37516",
journal = "ACS Applied Materials \& Interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "31",
}