Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy

A. Brady-Boyd, R. O'Connor, S. Armini, S. Selvaraju, G. Hughes, J. Bogan

Research output: Chapter in Book/Report/Conference proceedingConference Proceeding (Non-Journal item)

Abstract

Electroless deposited (ELD) cobalt with palladium as a catalyst, and an underlying self-assembled monolayer (SAM) was investigated for potential use in advanced complementary metal oxide semiconductor (CMOS) applications using both hard (HAXPES) and soft (XPS) x-ray photoelectron spectroscopy. HAXPES spectra established the uniformity of the deposited Co film and the nature of the buried Co-Si interface 20nm below the surface. The Pd is seen to diffuse through the Co following thermal annealing. While the deposited Co film is predominantly metallic, Co-silicide forms at the Co-Si interface upon deposition and decomposes with thermal anneal up to 500°C.

Original languageEnglish
Title of host publication18th International Conference on Nanotechnology, NANO 2018
PublisherIEEE Press
ISBN (Electronic)9781538653364
DOIs
Publication statusPublished - 27 Jan 2019
Externally publishedYes
Event18th International Conference on Nanotechnology, NANO 2018 - Cork, Ireland
Duration: 23 Jul 201826 Jul 2018

Publication series

NameProceedings of the IEEE Conference on Nanotechnology
Volume2018-July
ISSN (Print)1944-9399
ISSN (Electronic)1944-9380

Conference

Conference18th International Conference on Nanotechnology, NANO 2018
Country/TerritoryIreland
CityCork
Period23 Jul 201826 Jul 2018

Fingerprint

Dive into the research topics of 'Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy'. Together they form a unique fingerprint.

Cite this