On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

Anita Brady-Boyd; Robert O'Connor; Silvia Armini; V. Selvaraju; Greg Hughes; J. Bogan

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

Anita Brady-Boyd, Robert O'Connor, Silvia Armini, V. Selvaraju, Greg Hughes, J. Bogan

Department of Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference Proceeding (Non-Journal item)

Original language	English
Title of host publication	2017 Materials for Advanced Metallization Conference MAM
Publication status	Published - 2017
Event	Materials for Advanced Metallization Conference - Dresden, Germany Duration: 26 Mar 2017 → 29 Mar 2017

Conference

Conference	Materials for Advanced Metallization Conference
Abbreviated title	MAM2017
Country/Territory	Germany
City	Dresden
Period	26 Mar 2017 → 29 Mar 2017

Permanent link

Persistent link

1 Article

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers
Brady-Boyd, A., O'Connor, R., Armini, S., Selvaraju, V., Hughes, G. & Bogan, J., 01 Jan 2018, In: Applied Surface Science. 427, p. 260-266 7 p.
Research output: Contribution to journal › Article › peer-review
29 Citations (Scopus)

Cite this

@inproceedings{a1bc78ff16c147ef82119d58c160377d,

title = "On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers",

author = "Anita Brady-Boyd and Robert O'Connor and Silvia Armini and V. Selvaraju and Greg Hughes and J. Bogan",

year = "2017",

language = "English",

booktitle = "2017 Materials for Advanced Metallization Conference MAM",

note = "Materials for Advanced Metallization Conference, MAM2017 ; Conference date: 26-03-2017 Through 29-03-2017",

}

Brady-Boyd, A, O'Connor, R, Armini, S, Selvaraju, V, Hughes, G & Bogan, J 2017, On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers. in 2017 Materials for Advanced Metallization Conference MAM. Materials for Advanced Metallization Conference, Dresden, Germany, 26 Mar 2017.

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers. / Brady-Boyd, Anita; O'Connor, Robert; Armini, Silvia et al.
2017 Materials for Advanced Metallization Conference MAM. 2017.

Research output: Chapter in Book/Report/Conference proceeding › Conference Proceeding (Non-Journal item)

TY - GEN

T1 - On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

AU - Brady-Boyd, Anita

AU - O'Connor, Robert

AU - Armini, Silvia

AU - Selvaraju, V.

AU - Hughes, Greg

AU - Bogan, J.

PY - 2017

Y1 - 2017

M3 - Conference Proceeding (Non-Journal item)

BT - 2017 Materials for Advanced Metallization Conference MAM

T2 - Materials for Advanced Metallization Conference

Y2 - 26 March 2017 through 29 March 2017

ER -