Abstract
The electrical properties of moderately doped Na/n-GaAs(110) Schottky diodes, fabricated on the clean, cleaved GaAs(110) surface under ultra-high vacuum conditions, have been studied in situ. The Schottky barrier height extracted from the current-voltage characteristics of several diodes lies in the range 0.69-0.72 V. The barrier height obtained from the conventional capacitance-voltage technique (ignoring the image force correction of about 0.03 V) lies slightly higher (0.76-0.82 V). Moreover, the Ga and As 3d core-level emission, measured using synchrotron-radiation-excited soft-X-ray photo-emission spectroscopy, exhibit metal-induced shifts associated with semiconductor band bending. These measurements suggest that, like many other metals, Na pins the GaAs Fermi level close to mid-gap despite its extremely low work function and low electronegativity.
| Original language | English |
|---|---|
| Article number | 013 |
| Pages (from-to) | 547-549 |
| Number of pages | 3 |
| Journal | Semiconductor Science and Technology |
| Volume | 2 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 1987 |
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